Development of new main group resists for electron beam lithography and direct writing of nanostructures

This research project will be focused on the preparation of main group compounds and complexes containing elements from both group 13, 14, 15 and 16. These complexes will then be cast into thin films and investigated in pattern fabrication using electron-beam lithography (EBL) and extreme ultraviolet (EUV) lithography. Incorporation of heavy group 14 and 15 elements into resists using these clusters is expected to drastically increase their write speed and thus their performance. This work lies at the interface of synthetic main group chemistry and the nanofabrication of electronic devices. We also believe this could be a route to direct writing of nanostructures in a way that is more sustainable that present technologies.

The successful applicant will receive excellent training in the principles of solution phase coordination chemistry and synthetic solid-state techniques, specifically as applied to air-sensitive materials. On the materials side training in techniques for nanofabrication, including EBL. Training in characterisation tools such as X-ray crystallography, NMR spectroscopy and mass spectrometry will also be provided.